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Confocal wafer-inspection system

建立日期：2018/02/21
  • 作者： Camtek
  • 出處： USPTO-美國專利商標局
  • 內容： 本篇內容為Camtek於August 23, 2005 獲證之美國專利，下文為專利摘要，專利全文請連結參考網址，瀏覽專利全文所需看圖軟體請至 http://www.alternatiff.com/ 下載。

    A confocal wafer inspection system including: (a) a table to carry a wafer for inspection, the table having two vertical degrees of freedom to enable XY axis movements; (b) a movement device for moving the table along the degrees of freedom; (c) a confocal height measurement system, perpendicular to the table, for measuring the range to a point on a surface of the wafer and for enabling to recognize changes in surface altitude while the wafer moves with the table; and (d) a computer operative for: (i) holding a bumps map of the wafer; (ii) controlling the movement device; (iii) moving the table so that the measuring point of the confocal height measurement system crosses each bump of the wafer; (iv) storing a height profile of each bump; (v) comparing the height profiles or checking each height profile according to predetermined criteria or both; and (vi) enabling a results output. The invention also relates to a method for confocal wafer inspection.

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