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Spectrometric measuring instrument

建立日期：2018/02/21
  • 作者： Omron
  • 出處： USPTO-美國專利商標局
  • 內容： 本篇內容為Omron於August 12, 2008 獲證之美國專利，下文為專利摘要，專利全文請連結參考網址，瀏覽專利全文所需看圖軟體請至 http://www.alternatiff.com/ 下載。

    [Abstract]
    Providing a spectrometric measuring instrument suitable for in-line measurement for example in a semiconductor manufacturing process, an FPD manufacturing process, or the like, by realizing size reduction and imparting resistance to distance fluttering, angle fluttering in a horizontal direction, and angle fluttering in a perpendicular direction. A light interference type spectral element for gradually changing a wavelength of transmitted light by means of a transmitted position is provided immediately before the photoelectric transfer part array device, and based upon a light-receiving side optical system having the function of detecting a change in state of polarization of a reflected light from a sample, and a series of light-receiving amount data obtained from each of photoelectric transfer parts of the photoelectric transfer part array device, polarized light is analyzed. By fitting of a measured waveform to a theoretical waveform, a film thickness or film quality is obtained.

    [FIELD OF THE INVENTION]
    The present invention relates to a spectrometric measuring instrument using suitable changes in state of polarization of light for application of measurement of a thickness or quality (optical constant, sample structure, etc.) of a thin film, and the like, and particularly relates to a spectrometric measuring instrument suitable for in-line measurement performed in a production line.

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