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超表面之量產-利用CMOS兼容製程製作奈米光學元件之探討

建立日期:2021/12/27
  • 作者: 陽明交通電子工程/曾銘綸 教授
  • 出處: 2021 AOI論壇與展覽
  • 內容: 本篇為「2021 AOI論壇與展覽」演講簡報,內容簡介如下:

    Realizing compact and efficient photonic devices is essential for advancing the current optoelectronic technologies. Recently, metasurfaces have been found to be very useful for developing miniaturized imaging and sensing systems. Metasurfaces are planar devices whose optical functionalities can be engineered by tuning the nanoscale unit cell’s geometry. However, there is an unmet need for their industry-scale production. Here, we will report a CMOS-compatible process for wafer-scale fabrication of highly efficient metasurfaces. It is based on DUV lithography and can produce metasurface arrays on freestanding and transparent Al2O3 membranes. To reveal the versatility of the reported method, we made several metasurface chips for spectral filtering, lightwave control, and biosensing on 4-inch Si wafers. High uniformity of the fabricated metasurfaces and their high efficiencies for the targeted functionalities are verified. The reported method will accelerate the integration of metasurface-based photonics into the semiconductor industry and open exciting opportunities for cutting-edge instrumental applications.
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