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Laser Linear Encoder with both High Fabrication and Head-to-scale Tolerances
建立日期:2018/02/21
作者:
C. C. Wu,...等
出處:
台灣大學應用力學研究所 C. C. Wu,W. J. Wu, Z. S. Panand C. K. Lee
內容:
We introduce a new configuration for the optical head of a newly developed diffractive laser encoder system. This configuration has a high manufacturing tolerance and a high head-to-scale alignment tolerance, both of which can enhance the wider potential applicability of this newly designed laser encoder. The measurement principles of the encoder are discussed and detailed. We optimized the grating shape and analyzed the impact of the optical components and their arrangement on the measurement error. The head-to-scale alignment tolerance and the arrangement of components in the encoder were also determined. Finally, the measurement performance was evaluated and analyzed. Under nonenvironmentally controlled conditions, the measurement accuracy was found to be 37.3 nm with a standard deviation of 25.4 nm.
本論文已在Applied Optics, Vol. 46, No. 16, pp. 3169-3176 (June 2007)發表,全文請詳附加檔案連結說明。
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Laser Linear Encoder with both High ...
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