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System and method for inspecting patterned devices having microscopic conductors

建立日期：2018/02/21
  • 作者： Orbotech
  • 出處： USPTO-美國專利商標局
  • 內容： 本篇內容為Orbotech於June 24, 2008 獲證之美國專利，下文為專利摘要，專利全文請連結參考網址，瀏覽專利全文所需看圖軟體請至 http://www.alternatiff.com/ 下載。

    Orbotech後續針對此發明，另提出改良案，將另行介紹。

    An inspection system operative to inspect patterned devices having microscopic conductors, the system comprising a camera viewing a location of a candidate defect on a patterned substrate and acquiring thereat at least one image of the location, the camera defining an optical axis, the at least one image being illuminated by at least one illumination offset from the optical axis, the illumination being supplied along at least first and second axes of illumination that are mutually non-parallel in a plane corresponding to a plane of the patterned substrate, wherein a response to the illumination supplied along the first axis is differentiable from a response to the illumination supplied along the second axis and a defect classifier operative to receive the at least one image and to distinguish therewithin a candidate defect caused by a cut or a candidate defect caused by excess material, from one another and/or from other types of candidate defects.
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