技術簡介
Technology Description

白光干涉儀量測模組採用低相干干涉原理,利用寬頻白光源照射樣品,並透過干涉條紋的相位與強度分析,獲得奈米級的三維表面形貌與高度資訊。本技術具備非接觸、高精度與快速量測等特性,特別適用於半導體晶圓表面形貌及粗糙度等參數量測。

The white light interferometer module uses low-coherence interferometry, where a broadband light source illuminates the sample and interference fringe phase and intensity are analyzed to obtain nanometer-level 3D surface profiles and height information. Featuring non-contact, high-precision, and fast measurement, it is ideal for wafer topography, and roughness measurement。

技術規格
Specifications
  • 晶圓表面形貌量測範圍:1 μm – 400 μm
    Topography height range:1 μm – 400 μm
  • 晶圓表面形貌量測重覆性:≤ 0.1 μm
    Topography measurement repeatability:≤ 0.1 μm
    側向量測解析度:≥ 0.1 μm
    Lateral resolution:≥ 0.1 μm
    縱向量測解析度 ≥ 1 nm
    Vertical resolution:≥ 1 nm
  • 晶圓表面粗糙度量測範圍:≥ 1.0 nm
    Roughness measurement range:≥ 1.0 nm
  • 晶圓表面粗糙度量測重覆性:≤ 0.1 nm
    Roughness measurement repeatability:≤ 0.1 nm
  • 量測範圍:6吋、8吋、12吋
    Measuring area:6、8、12 inch wafer
系統外觀圖
系統外觀圖
應用範圍
Applications
  1. 晶圓表面形貌量測
    Wafer Surface Topography measurement
  2. 晶圓表面粗糙度量測
    Wafer Surface Roughness measurement
  3. 矽、碳化矽、氮化鎵晶圓
    Si, SiC, GaN wafer
晶圓表面粗糙度量測技術
晶圓表面粗糙度量測技術
晶圓表面粗糙度分析圖
晶圓表面粗糙度分析圖