技術簡介
Technology Description

本系統透過高解析光場掃描技術,解析超透鏡的焦點分布與光學性能。透過理論分析與數學擬合方法,將光場強度分布轉換為相位分布。此量測系統可量測參數為焦距、數值孔徑、Strehl ratio、效率與相位輪廓等關鍵光學參數,為金屬透鏡設計驗證與製程品質管控提供高精度檢測解決方案。

The system utilizes high-resolution light-field scanning technology to reconstruct the focal distribution and optical performance of the metalens. By converting the light-field intensity distribution into a phase distribution, complete wavefront information can be obtained. Through theoretical analysis and mathematical fitting, the system can measure key optical parameters such as focal length, numerical aperture, Strehl ratio, efficiency, and phase profile, providing a high-precision inspection solution for metalens design verification and process quality control.

技術規格
Specifications
  • 繞射效率準確度: ±0.2%
    Diffraction efficiency accuracy: ±0.2%
  • 有效焦距準確度: ±0.2%
    Effective focal length accuracy: ±0.2%
  • 量測時間:≤ 10 s per metalens
    Measuring time ≤ 10 s per metalens
  • 波前像差解析: ≤ λ/40
    Wavefront aberration resolution: ≤ λ/40
系統外觀圖
系統外觀圖
應用範圍
Applications
  1. 超平面透鏡與光學晶片開發商
    Metalens and optical chip developers
  2. 相位量測
    Phase measurement
  3. 光電與半導體封裝檢測業者
    Optoelectronics and semiconductor packaging
Phase map
Phase map
光場分布
光場分布
軟體介面圖
軟體介面圖