技術簡介
Technology Description

X射線反射率(XRR)利用X射線以極低掠入射角照射薄膜表面,量測鏡面反射強度隨角度的變化。當入射角超過臨界角後,來自不同薄膜界面的反射X射線互相干涉,形成Kiessig fringes。藉由反射曲線與層狀薄膜模型擬合,可非破壞性評估薄膜厚度、密度,以及表面與界面粗糙度。
X-ray reflectivity (XRR) measures specular reflected X-ray intensity as a function of grazing incidence angle. Above the critical angle, interference between X-rays reflected at film interfaces produces Kiessig fringes. By fitting the reflectivity profile with a layered-film model, film thickness, density, and surface/interface roughness can be evaluated non-destructively.

技術規格
Specifications
  • System: PANalytical X’Pert PRO MRD
  • X-ray source: Cu Kα, λ = 0.154 nm
  • Thickness calibration: 1.5 nm – 200 nm (SiO₂ / HfO₂ / Al₂O₃)
  • Expanded uncertainty: 0.02 nm (95 % confidence level)
PANalytical X’Pert PRO MRD
PANalytical X’Pert PRO MRD
XRR measurement chamber
XRR measurement chamber
應用範圍
Applications
  1. 薄膜厚度量測
    Thin film thickness measurement
  2. 多層膜結構分析
    Multilayer structure analysis
  3. 薄膜密度評估
    Film density evaluation
  4. 表面/界面粗糙度分析
    Surface / interface roughness analysis
XRR 量測幾何 (Measurement Geometry)
XRR 量測幾何 (Measurement Geometry)
XRR 量測結果 (Measured Data and Fitted Curve)
XRR 量測結果 (Measured Data and Fitted Curve)