技術詳情
首頁 > 技術鏈結 > X射線反射率薄膜量測技術X射線反射率(XRR)利用X射線以極低掠入射角照射薄膜表面,量測鏡面反射強度隨角度的變化。當入射角超過臨界角後,來自不同薄膜界面的反射X射線互相干涉,形成Kiessig fringes。藉由反射曲線與層狀薄膜模型擬合,可非破壞性評估薄膜厚度、密度,以及表面與界面粗糙度。
X-ray reflectivity (XRR) measures specular reflected X-ray intensity as a function of grazing incidence angle. Above the critical angle, interference between X-rays reflected at film interfaces produces Kiessig fringes. By fitting the reflectivity profile with a layered-film model, film thickness, density, and surface/interface roughness can be evaluated non-destructively.
- System: PANalytical X’Pert PRO MRD
- X-ray source: Cu Kα, λ = 0.154 nm
- Thickness calibration: 1.5 nm – 200 nm (SiO₂ / HfO₂ / Al₂O₃)
- Expanded uncertainty: 0.02 nm (95 % confidence level)
PANalytical X’Pert PRO MRD
XRR measurement chamber
- 薄膜厚度量測
Thin film thickness measurement - 多層膜結構分析
Multilayer structure analysis - 薄膜密度評估
Film density evaluation - 表面/界面粗糙度分析
Surface / interface roughness analysis
XRR 量測幾何 (Measurement Geometry)
XRR 量測結果 (Measured Data and Fitted Curve)