原子力顯微鏡量測技術

AFM為半導體與奈米材料分析用量測系統，可量測參數為三維表面形貌、表面粗糙度(Ra/Rq)、階高(Step height)及奈米級尺寸等。以奈米級探針搭配微懸臂樑掃描樣品表面，量測探針尖端與樣品表面原子間交互作用力所產生的微小偏折，並透過回饋演算建構出樣品的高解析度三維形貌及物理特性。
AFM system can measure the parameters of 3D surface topography, surface roughness(Ra/Rq), step height, and nanoscale dimensions. The nanoscale surface measurement system adapts a nanoscale probe and a microcantilever to measure the minute deflection caused by the atomic interaction force between the probe tip and the sample surface. The high-resolution 3D topography and physical properties of the sample could be calculated and constructed by the feedback system and algorithm.