技術詳情
首頁 > 技術鏈結 > 薄膜量測系統—分光式橢圓偏光儀分光式橢圓偏光儀可由實驗上所量得的橢圓偏光函數 tanY與 cosD的最小平方法擬合,來間接的求得薄膜的厚度、折射率、消光係數,是一種無損無接觸的光學測量技術。
A spectroscopic ellipsometer can indirectly determine the film thickness, refractive index, and extinction coefficient by fitting the experimentally measured ellipsometric parameters, tan Ψ and cos Δ, using the least-squares method. It is a non-destructive and non-contact optical metrology technique.
- Wafer size: Up to 12-inch wafers
- Film thickness range: 0.1 nm ~ 10 m
- Spectral range: 190 nm ~ 2100 nm
- Automatic stage
- Oxide, Nitride, PR, polymer film on Si, ITO, wafer
- Angle of Incidence: 40° ~ 90°
- Spot Size: < 3 mm
Spectroscopic Ellipsometry
- 薄膜厚度量測
Thin film thickness measurement - 厚膜厚度量測
Thick film thickness measurement - 折射率及消散係數量測
n & k optical parameters measurement
Thin film thickness fitting