技術簡介
Technology Description

分光式橢圓偏光儀可由實驗上所量得的橢圓偏光函數 tanY與 cosD的最小平方法擬合,來間接的求得薄膜的厚度、折射率、消光係數,是一種無損無接觸的光學測量技術。
A spectroscopic ellipsometer can indirectly determine the film thickness, refractive index, and extinction coefficient by fitting the experimentally measured ellipsometric parameters, tan Ψ and cos Δ, using the least-squares method. It is a non-destructive and non-contact optical metrology technique.

技術規格
Specifications
  • Wafer size: Up to 12-inch wafers
  • Film thickness range: 0.1 nm ~ 10 m
  • Spectral range: 190 nm ~ 2100 nm
  • Automatic stage
  • Oxide, Nitride, PR, polymer film on Si, ITO, wafer
  • Angle of Incidence: 40° ~ 90°
  • Spot Size: < 3 mm
Spectroscopic Ellipsometry
Spectroscopic Ellipsometry
應用範圍
Applications
  1. 薄膜厚度量測
    Thin film thickness measurement
  2. 厚膜厚度量測
    Thick film thickness measurement
  3. 折射率及消散係數量測
    n & k optical parameters measurement
Thin film thickness fitting
Thin film thickness fitting