晶圓式溫度量測儀

目前先進製程對溫度精度要求提昇，能快速且有效測量晶圓全域溫度分布的TC wafer需求明確。但受限於系統整合技術、相關溫度材料開發，以及可靠度測試驗證設備和場域，使得無線TC wafer產品尚未國產化。

無線TC wafer可減少開啟chamber之時機，每次啟閉chamber使產線停止，影響產能甚巨。製程條件同步之即時溫度監控，可對比蝕刻後之關鍵尺寸量測，為製程參數控制之重要指標，並可實現半導體製程、量測與校正。本技術適用於晶圓代工廠、光學元件、光阻、材料、設備及檢測業者。

Advanced semiconductor manufacturing processes require increasingly stringent temperature precision, driving high demand for TC wafers that rapidly and accurately measure full-wafer temperature distribution.

A wireless TC wafer minimizes the need to open vacuum chambers, avoiding production line downtime and throughput loss. Real-time temperature monitoring synchronized with process conditions serves as a vital index for process parameter control and CD correlation after etching. This technology is applicable to wafer foundries, optical devices, photoresists, materials, equipment, and metrology suppliers.